USPTO Patents Application 10050484

L

Number

Hits

Search Text

DB

Time stamp

-

1

("6451512") .PN.

USPAT;

2003/06/28

US-PGPUB

12:30

-

3

(("5563238") or ("3811931") or

US PAT;

2003/06/28

("3676401") ) .PN.

US-PGPUB

15 : 11

-

1862

(resist or photoresist or photopolymer$7 )

USPAT;

2003/06/28

same (coupl$3 or bond$3 or prim$3 or

US-PGPUB;

15 :29

adhes$7) with (lactic or ketone or

EPO; JPO;

organometal$3 or metal adj salt or

IBM_TDB

siloxane or silane or

hexamethyldisilazane or HMDS)

-

1101

( (resist or photoresist or

USPAT;

2003/06/28

photopolymer$7) same (coupl$3 or bond$3

US-PGPUB;

15:46

or prim$3 or adhes$7) with (lactic or

EPO; JPO;

ketone or organometal$3 or metal adj salt

IBM_TDB

or siloxane or silane or

hexamethyldisilazane or HMDS) ) and

(semiconduct$3 or semi adj conduct$3 or

wafer or silicon or "Si") same (coupl$3

or bond$3 or prim$3 or adhes$7)

-

397

( ( (resist or photoresist or

USPAT;

2003/06/28

photopolymer$7) same (coupl$3 or bond$3

US-PGPUB;

15:47

or prim$3 or adhes$7) with (lactic or

EPO; JPO;

ketone or organometal$3 or metal adj salt

IBM_TDB

or siloxane or silane or

hexamethyldisilazane or HMDS) ) and

(semiconduct$3 or semi adj conduct$3 or

wafer or silicon or "Si") same (coupl$3

or bond$3 or prim$3 or adhes$7) ) and

(degrad$4 or decompos$5 or break$3 or

downgrad$4 or deteriorat$4 or

disintegrat$4 or decay$3 or dissolv$4 or

fragment$4) same (coupl$3 or bond$3 or

prim$3 or adhes$7)

-

42

(({(resist or photoresist or

USPAT;

2003/06/28

photopolymer$7) same (coupl$3 or bond$3

US-PGPUB;

15:50

or prim$3 or adhes$7) with (lactic or

EPO; JPO;

ketone or organometal$3 or metal adj salt

IBM TDB

or siloxane or silane or

hexamethyldisilazane or HMDS) ) and

( semi conduct $3 or semi adj conduct $3 or

wafer or silicon or "Si") same (coupl$3

or bond$3 or prim$3 or adhes$7) ) and

(degrad$4 or decompos$5 or break$3 or

downgrad$4 or deteriorat$4 or

disintegrat$4 or decay$3 or dissolv$4 or

fragment$4) same (coupl$3 or bond$3 or

prim$3 or adhes$7) ) and

(430/311,319,327-329) .eels.

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355

12

({((resist or photoresist or
photopolymer$7) same (coupl$3 or bond$3
or prim$3 or adhes$7) with (lactic or
ketone or organometal$3 or metal adj salt
or siloxane or silane or
hexamethyldisilazane or HMDS) ) and

(semiconduct$3 or semi adj conduct$3 or
wafer or silicon or "Si") same (coupl$3
or bond$3 or prim$3 or adhes$7) ) and

(degrad$4 or decompos$5 or break$3 or
downgrad$4 or deteriorat$4 or
disintegrat$4 or decay$3 or dissolv$4 or
fragment$4) same (coupl$3 or bond$3 or
prim$3 or adhes$7)) not ((({(resist or
photoresist or photopolymer$7 ) same

(coupl$3 or bond$3 or prim$3 or adhes$7)
with (lactic or ketone or organometal$3
or metal adj salt or siloxane or silane
or hexamethyldisilazane or HMDS) ) and

(semi conduct $3 or semi adj conduct$3 or
wafer or silicon or "Si") same (coupl$3
or bond$3 or prim$3 or adhes$7) ) and

(degrad$4 or decompos$5 or break$3 or
downgrad$4 or deteriorat$4 or
disintegrat$4 or decay$3 or dissolv$4 or
fragment$4) same (coupl$3 or bond$3 or
prim$3 or adhes$7) ) and

(430/311,319,327-329) .eels.)

{(light) near3 (degrad$4) near3 (prim$3
or adhes$7) same (resist or photoresist) )
not ( ( { (resist or photoresist or
photopolymer$7) same (coupl$3 or bond$3
or prim$3 or adhes$7) with (lactic or
ketone or organometal$3 or metal adj salt
or siloxane or silane or
hexamethyldisilazane or HMDS)) and

(semi conduct $3 or semi adj conduct$3 or
wafer or silicon or "Si") same (coupl$3
or bond$3 or prim$3 or adhes$7) ) and

(degrad$4 or decompos$5 or break$3 or
downgrad$4 or deteriorat$4 or
disintegrat$4 or decay$3 or dissolv$4 or
fragment$4) same (coupl$3 or bond$3 or
prim$3 or adhes$7)) not (((((resist or
photoresist or photopolymer$7) same

(coupl$3 or bond$3 or prim$3 or adhes$7)
with (lactic or ketone or organometal$3
or metal adj salt or siloxane or silane
or hexamethyldisilazane or HMDS)) and

(semi conduct $3 or semi adj conduct $3 or
wafer or silicon or "Si") same {coupl$3
or bond$3 or prim$3 or adhes$7) ) and

(degrad$4 or decompos$5 or break$3 or
downgrad$4 or deteriorat$4 or
disintegrat$4 or decay$3 or dissolv$4 or
fragment$4) same (coupl$3 or bond$3 or
prim$3 or adhes$7)) and

(430/311,319,327-329) .eels.)

((light) near3 (degrad$4) near3 (prim$3
or adhes$7) same (resist or photoresist))

((light) near3 (degrad$4) near3 (prim$3
or adhes$7) and (resist or photoresist))

((light) near3 (degrad$4) with (primer or
priming) same (resist or photoresist))

US PAT/
US-PGPUB;
EPO; JPO;
IBM TDB

2003/07/09
12:01

US PAT ;
US-PGPUB;
EPO; JPO;
IBM TDB

US PAT;
US-PGPUB;
EPO; JPO;
IBM_TDB
US PAT;
US-PGPUB;
EPO; JPO;
IBM_TDB
US PAT;
US-PGPUB;
EPO; JPO;
IBM TDB

2003/07/09
12:39

2003/07/09
12:40

2003/07/16
16:26

2003/07/09
12:47

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Page 2

-

88

( (bilayer or bi adj layer) same positive

US PAT ;

2003/07/16

near2 (resist or photoresist))

US-PGPUB; '

16:27

EPO; JPO;

IBM TDB

-

74

(((bilayer or bi adj layer) same positive

US PAT /

2003/07/18

near2 (resist or photoresist))) and

US-PGPUB;

13 : 13

(thick or thickness) same (resist or

EPO; JPO;

photoresist)

IBM_TDB

-

2

( (hexamethyldisilazane or HMDS) near5

USPAT;

2003/07/18

decompos$4) same (resist or photoresist)

US-PGPUB;

14 : 06

EPO; JPO;

IBM_TDB

-

12

((hexamethyldisilazane or HMDS) nearS

USPAT;

2003/07/18

(light or uv) ) same (resist or

US-PGPUB;

15 : 43

photoresist)

EPO; JPO;

IBM_TDB

-

92

(134/1 .3) . eels . and (light or uv) same

USPAT;

2003/07/18

(resist or photoresist)

US-PGPUB;

15 : 34

EPO; JPO;

IBM_TDB

-

6

( (134/1.3) .eels, and (light or uv) same

USPAT;

2003/07/18

(resist or photoresist)) and

US-PGPUB;

15:35

(hexamethyldisilazane or HMDS)

EPO; JPO;

IBM TDB

-

17

((hexamethyldisilazane or HMDS) near5

USPAT;

2003/07/18

(light or uv or ultraviolet) ) same

US-PGPUB;

16:03

(resist or photoresist)

EPO; JPO;

IBM_TDB

-

16

(light or uv or ultraviolet) same

USPAT;

2003/07/18

( (bond$3 or coupl$3) near2 (strength or

US-PGPUB;

16:17

energy)) same ((silicon or Si) nearS

EPO; JPO;

(oxygen) )

TDM THU

2003/07/18

19

(light or uv or ultraviolet) same

USPAT;

( (bond$3 or coupl$3) near2 (strength or

US-PGPUB;

16: 18

energy)) same ("Si— 0" or "0— Si")

EPO; JPO;

IBM TDB

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